Thin Film Deposition & Reactive Ion Etching
A Lesker ALD150LX and Oxford FlexAl system are available to deposit ultra-thin conformal films of oxides and nitrides.
First Nano Rapid Thermal Processor
Controlled heating of samples for annealing and material modification.
High temperature deposition of high quality dielectric films
Oxford Plasmalab System 100 PECVD
Plasma enhanced deposition of silicon based films.
Oxford Plasmalab System 100 Reactive Ion Etchers
Chlorine, fluorine, & cryogenic dry etching of thin films and silicon substrates.
DiamoTek 700-6 Microwave Plasma Diamond CVD Film Deposition Diamond Film Deposition
Deposition of nano-crystalline diamond thin films.
DC Magnetron sputtering and electron beam evaporation are available for physical vapor deposition of metals, as well as some dielectric and semiconducting materials.
High Intensity Plasma Processing Apparatus (HIPPA): Carbon Nanomaterials
Growth of carbon nanofibers and nanospikes.
Electron Beam and Optical Lithography
JEOL 8100 FS Electron Beam Lithography
Create nanoscale patterns in electron beam resist across large areas at high speeds
SUSS MicroTech Contact Aligner
Align and expose photoresist patterns using masks created here or at home
Design and create your own masks onsite in hours
Heidelberg MLA150 Maskless Aligner (arriving 2024)
Rapid mask and direct substrate writing
3D Direct-write ion, electron and optical processing
Nanoscribe Photonics Professional GT System
Multiphoton lithography to create unique 3D polymer architectures
Raith Velion Multiple Ion Species Ion Beam Lithography System
Multi-ion direct write processing at the wafer-scale
Thermo Scientific Helios 5 Hydra UX DualBeam Multiple Ion Plasma FIB / SEM
Precise focused ion beam (FIB) milling and etching combined with metal/insulator deposition for nanoscale prototyping, machining, 2D and 3D-characterization, and analysis
Zeiss Orion NanoFab Helium Ion Microscope
Helium and neon offer extensive possibility for imaging and exploring creation of functional defects in materials
Design, Characterization & Packaging
Merlin FE-SEM can achieve an image resolution of 1 nanometer and is coupled with a Bruker energy dispersive X-ray spectroscopy (EDS) system
Phenom XL Scanning Electron Microscope
Benchtop imaging with nanoscale resolution
Wyko NT9800 Optical Profilometer
Optical measurement of surface topography and vibrational characteristics
Work with staff members to layout your project and create physical models before you arrive and throughout your collaboration.
Wafers to chips with precision
SCS PDS2010 Lab Coater 2 Parylene Coating System
Deposit parylene for encapsulation and dry lift-off
Optical Thin Film Characterization
Interferometric and ellipsometric measurements of thin films
Bio-affiliate Labs & Optical Microscopy
Ultra high resolution and Confocal Fluorescence Microscopy, Time-lapse brightfield and epifluorscence microscopy and facilities for cell culture and sample preparation are available.
Understand the performance of your devices in controlled environments