Nanofabrication Research Laboratory
Nanofabrication Research Laboratory
Develops methods to fabricate nanostructures using best-in-class lithographic, etching, thin-film deposition, and characterization tools as well as bio–compatible synthesis capabilities.
- 3D Direct-Write Fabrication Nanoscribe
- Nanoscribe Pro GT Laser Lithography 3D Direct-Write System
(Nanoscribe 2-Photon Lithography | ORNL)
- Nanoscribe Pro GT Laser Lithography 3D Direct-Write System
- Multi-ion Species FIB Lithography and Nanomachining
- Advanced SEM
- Zeiss Merlin SEM (+EDS)
(Zeiss Merlin FE-SEM | ORNL)
- Zeiss Merlin SEM (+EDS)
- Dual-beam SEM/FIB
- Nova 600 NanoLab dual-beam SEM/FIB
(Nova 600 NanoLab dual beam SEM/FIB | ORNL)
- Nova 600 NanoLab dual-beam SEM/FIB
- E-beam Lithography
- JEOL 9300FS 100kV Electron Beam Lithography System
(Electron Beam Lithography | ORNL)
- JEOL 9300FS 100kV Electron Beam Lithography System
- Rapid Thermal Processing
- First Nano Rapid Thermal Processor
(First Nano Rapid Thermal Processor | ORNL)
- First Nano Rapid Thermal Processor
- Helium and Neon Ion Milling and Imaging
- Zeiss Orion NanoFab Helium Ion Microscope
(Zeiss Orion NanoFab Helium Ion Microscope | ORNL)
- Zeiss Orion NanoFab Helium Ion Microscope
- General Cleanroom Use
- Tystar CVD Furnace
(Tystar Furnace CVD | ORNL) - Oxford Plasmalab System 100 PECVD
(Oxford PECVD | ORNL) - Oxford Plasmalab 100 RIE/ICP (chlorine, fluorine, & cryogenic processing)
(Reactive Ion Etch | ORNL) - Wyko NT9800 Optical Profilometer
(Wyko NT9800 Optical Profilometer | ORNL) - Asylum MFP-3D Atomic Force Microscopy
(Cleanroom Atomic Force Microscopy | ORNL) - DiamoTek 700-6 Microwave Plasma Diamond CVD Film Deposition
(Diamond Film Deposition | ORNL) - Accretech SS10 Dicing Saw
(Accretech SS10 dicing saw | ORNL) - Phenom XL Scanning Electron Microscopy
(Phenom XL SEM | ORNL) - Contact Lithography
(SUSS MicroTech Contact Aligner | ORNL) - Physical Vapor Deposition
(AJA International ATC 2400 and a Thermionics VE-240 | ORNL) - Mask Writer
(Heidelberg DW 66 | ORNL)
- Tystar CVD Furnace
- Plasma Atomic Layer Deposition
- Oxford FlexAI Atomic Layer Deposition
(Oxford FlexAl Atomic Layer Deposition | ORNL)
- Oxford FlexAI Atomic Layer Deposition
- Process Design for Cleanroom Processes
- LayoutEditor
(LayoutEditor | LayoutEditor Documentation) - Comsol multiphysics finite element numerical solver
(COMSOL - Software for Multiphysics Simulation) - Lumerical Finite Difference Time Domain Maxwell Solver
- (Lumerical - Maxwell Solver)
- GenISys Beamer – supporting electron beam lithography exposure
(BEAMER - GenISys GmbH (genisys-gmbh.com))
- LayoutEditor
NRL Bio-Inspired Nanomaterials
- DC-PECVD synthesis of VACNFs (vertically aligned carbon nanofibers) or CNSs (carbon nanospikes)
- Custom PE-CVD system
(Carbon PE-CVD | ORNL)
- Custom PE-CVD system
- Confocal Microscopy
- Carl Zeiss 710: Environmentally controlled stage for live cell multi–channel imaging
- Carl Zeiss Elyra Superresolution with structured illumination microscopy (SR-SIM) and photo-activated localization microscopy (PAL-M)
- Leica TCS SP2 MP scanning laser confocal microscope for multiphoton (rgb) excitation and ultraviolet compatible
- Epifluorescent Microscopy
- Carl Zeiss Axioskop 2 FS with epifluorescent top illumination and Nomarski phase contrast optics (bottom). CCD imaging + optional patch clamp and ceramic objectives for electrophysiology measurements
- Scanning Probe Microscopy with Fluorescence Imaging System
- Molecular Imaging PicoPlus. Closed loop multipurpose scanners (10 µm & 100 µm) for positioning registration/lithography. Liquid cells, flow cells and temperature control capabilities are also available. Simultaneous topography and chemical recognition is possible.