Nanofabrication Research Laboratory

Nanofabrication Research Laboratory

Develops methods to fabricate nanostructures using best-in-class lithographic, etching, thin-film deposition, and characterization tools as well as bio–compatible synthesis capabilities.

• 3D Direct-Write Fabrication Nanoscribe
  • Nanoscribe Pro GT Laser Lithography 3D Direct-Write System
    (Nanoscribe 2-Photon Lithography | ORNL)

• Multi-ion Species FIB Lithography and Nanomachining
  • Raith Velion
• Advanced SEM
  • Zeiss Merlin SEM (+EDS)
    (Zeiss Merlin FE-SEM | ORNL)

• Dual-beam SEM/FIB
  • Nova 600 NanoLab dual-beam SEM/FIB
    (Nova 600 NanoLab dual beam SEM/FIB | ORNL)

• E-beam Lithography
  • JEOL 9300FS 100kV Electron Beam Lithography System
    (Electron Beam Lithography | ORNL)

• Rapid Thermal Processing
  • First Nano Rapid Thermal Processor
    (First Nano Rapid Thermal Processor | ORNL)

• Helium and Neon Ion Milling and Imaging
  • Zeiss Orion NanoFab Helium Ion Microscope
    (Zeiss Orion NanoFab Helium Ion Microscope | ORNL)

• General Cleanroom Use
  • Tystar CVD Furnace
    (Tystar Furnace CVD | ORNL)
  • Oxford Plasmalab System 100 PECVD
    (Oxford PECVD | ORNL)
  • Oxford Plasmalab 100 RIE/ICP (chlorine, fluorine, & cryogenic processing)
    (Reactive Ion Etch | ORNL)
  • Wyko NT9800 Optical Profilometer
    (Wyko NT9800 Optical Profilometer | ORNL)
  • Asylum MFP-3D Atomic Force Microscopy
    (Cleanroom Atomic Force Microscopy | ORNL)
  • DiamoTek 700-6 Microwave Plasma Diamond CVD Film Deposition
    (Diamond Film Deposition | ORNL)
  • Accretech SS10 Dicing Saw
    (Accretech SS10 dicing saw | ORNL)
  • Phenom XL Scanning Electron Microscopy
    (Phenom XL SEM | ORNL)
  • Contact Lithography
    (SUSS MicroTech Contact Aligner | ORNL)
  • Physical Vapor Deposition
    (AJA International ATC 2400 and a Thermionics VE-240 | ORNL)
  • Mask Writer
    (Heidelberg DW 66 | ORNL)

• Plasma Atomic Layer Deposition
  • Oxford FlexAI Atomic Layer Deposition
    (Oxford FlexAl Atomic Layer Deposition | ORNL)

• Process Design for Cleanroom Processes
  • LayoutEditor
    (LayoutEditor | LayoutEditor Documentation)
  • Comsol multiphysics finite element numerical solver
    (COMSOL - Software for Multiphysics Simulation)
  • Lumerical Finite Difference Time Domain Maxwell Solver
  • (Lumerical - Maxwell Solver)
  • GenISys Beamer – supporting electron beam lithography exposure
    (BEAMER - GenISys GmbH (genisys-gmbh.com))

NRL Bio-Inspired Nanomaterials

• DC-PECVD synthesis of VACNFs (vertically aligned carbon nanofibers) or CNSs (carbon nanospikes)
  • Custom PE-CVD system
    (Carbon PE-CVD | ORNL)
• Confocal Microscopy
  • Carl Zeiss 710: Environmentally controlled stage for live cell multi–channel imaging
  • Carl Zeiss Elyra Superresolution with structured illumination microscopy (SR-SIM) and photo-activated localization microscopy (PAL-M)
  • Leica TCS SP2 MP scanning laser confocal microscope for multiphoton (rgb) excitation and ultraviolet compatible
• Epifluorescent Microscopy
  • Carl Zeiss Axioskop 2 FS with epifluorescent top illumination and Nomarski phase contrast optics (bottom).  CCD imaging + optional patch clamp and ceramic objectives for electrophysiology measurements
• Scanning Probe Microscopy with Fluorescence Imaging System
  • Molecular Imaging PicoPlus.  Closed loop multipurpose scanners (10 µm & 100 µm) for positioning registration/lithography.  Liquid cells, flow cells and temperature control capabilities are also available. Simultaneous topography and chemical recognition is possible.