Steven Randolph
Group Leader - Focused, electron- and ion-beam-induced surface chemistry
Dayrl Briggs
General Cleanroom, ALD, LPCVD, PECVD, ICP RIE, RTP
Pat Collier
Crossbar measurements, goniometer, droplet interface bilayer characterization
Sujoy Ghosh
Nanofabrication, Focus Ion Beam (FIB) Microscopy, Nanoscale electronic & Opto-electronic transport phenomena
Ivan Kravchenko
Raith Velion FIB, electron beam lithography, atomic force microscopy
Jack Lasseter
DC PECVD, E-Beam evaporator, DC Sputtering, Zeiss Merlin SEM, Phenom SEM
Nick Lavrik
Nanoscribe 2 photon lithography, Heidelberg laser mask writer, electron beam lithography, Renishaw Raman microscope, Wyko optical profilometer
Kevin Lester
Experienced cleanroom engineer specializing in equipment and facility installations, repairs and upgrades as well as 3d modeling and design
Bernadeta Srijanto
JEOL Ebeam Lithography, Suss contact aligner
Leslie Wilson
NanoDiamond CVD
Lacey Pack
Group Admin