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Carbon PE-CVD

HIPPA is a unique CNMS-constructed tool for the plasma-enhance chemical vapor growth of carbon nanostructures over large areas.  This technique finds applications in a number of projects for creating biological interfaces, detectors, and electrochemically active nanostructures.


  • Accommodates 4-inch wafer or substrate
  • Heated Platen up to 700 °C,
  • Gases are C2H2 and NH3,
  • Vacuum range 4 torr to 50 torr,
  • Plasma .25A to 4A. 

Recent Publications

CO2 Electroreduction using carbon nanospike/copper electrode

Electrochemical reduction of N2 to NH3