Specifications
- Accommodates 4-inch wafer or substrate
- Heated Platen up to 700 °C,
- Gases are C2H2 and NH3,
- Vacuum range 4 torr to 50 torr,
- Plasma .25A to 4A.
Recent Publications
CO2 Electroreduction using carbon nanospike/copper electrode
Specifications
Recent Publications
CO2 Electroreduction using carbon nanospike/copper electrode