For outstanding scientific impact in computational soft matter and nanoscience through cross-discipline collaboration to address materials problems and discover new functional materials
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All Corporate Fellow summaries reflect the awardee and ORNL at the time the fellowship was awarded.
2013
2012
For environmental-effects research related to energy technologies and their use, focusing on the impacts of climate and atmospheric changes on the physiology, growth, and biogeochemical cycles of North American forest ecosystems.
2010
For his pioneering research in atom probe field-ion microscopy and atom probe tomography, most recently to understand the unprecedented properties and behaviors of nanostructured ferritic steels.
2009
For far-reaching accomplishments on national security issues relating to nuclear weapons proliferation, security of nuclear materials, and counterterrorism.
For contributions to the methodology for electronic structure calculations and in applications to diverse classes of materials.
2006
For his leadership in light-water reactor development, reactor safety, and the disposition of uranium waste.
For contributions to high-performance networking and multiple-sensor fusion and for developing a unifying theory of information fusion.
2004
For innovative research in nuclear structure physics, particularly in areas leading to a quantitative understanding of the excitation and decay of the elementary collective modes of nuclei, and for vision and scientific and technical leadership in building the Holifield Radioactive Ion Beam Facility into a forefront laboratory for nuclear science.
1999
For pioneering accomplishments in the fields of global optimization, artificial neural networks, and high performance computing based on quantum devices.
1994
For outstanding contributions to many areas of solid-state physics, including the electronic structure of metals, ultrarapid melting and solidification phenomena, pulsed-laser deposition and epitaxial film growth, high-temperature superconductivity, and beam-assisted processing of thin films and superlattices.