Two of the researchers who share the Nobel Prize in Chemistry announced Wednesday—John B. Goodenough of the University of Texas at Austin and M. Stanley Whittingham of Binghamton University in New York—have research ties to ORNL.
Researchers used neutron scattering at Oak Ridge National Laboratory’s Spallation Neutron Source and High Flux Isotope Reactor to better understand how certain cells in human tissue bond together.
A modern, healthy transportation system is vital to the nation’s economic security and the American standard of living. The U.S. Department of Energy’s Oak Ridge National Laboratory (ORNL) is engaged in a broad portfolio of scientific research for improved mobility
As a computational hydrologist at Oak Ridge National Laboratory, Ethan Coon combines his talent for math with his love of coding to solve big science questions about water quality, water availability for energy production, climate change, and the
Researchers used neutron scattering at Oak Ridge National Laboratory’s Spallation Neutron Source to probe the structure of a colorful new material that may pave the way for improved sensors and vivid displays.
Using additive manufacturing, scientists experimenting with tungsten at Oak Ridge National Laboratory hope to unlock new potential of the high-performance heat-transferring material used to protect components from the plasma inside a fusion reactor. Fusion requires hydrogen isotopes to reach millions of degrees.
A detailed study by Oak Ridge National Laboratory estimated how much more—or less—energy United States residents might consume by 2050 relative to predicted shifts in seasonal weather patterns
A new method developed at Oak Ridge National Laboratory improves the energy efficiency of a desalination process known as solar-thermal evaporation.
Scientists at Oak Ridge National Laboratory studying quantum communications have discovered a more practical way to share secret messages among three parties, which could ultimately lead to better cybersecurity for the electric grid
Researchers have pioneered a new technique using pressure to manipulate magnetism in thin film materials used to enhance performance in electronic devices.