Two different teams that included Oak Ridge National Laboratory employees were honored Feb. 20 with Secretary’s Honor Achievement Awards from the Department of Energy. This is DOE's highest form of employee recognition.
Anne Campbell, a researcher at ORNL, recently won the Young Leaders Professional Development Award from the Minerals, Metals & Materials Society, or TMS, and has been chosen as the first recipient of the Young Leaders International Scholar Program award from TMS and the Korean Institute of Metals and Materials, or KIM.
Hilda Klasky, an R&D staff member in the Scalable Biomedical Modeling group at ORNL, has been selected as a senior member of the Association of Computing Machinery, or ACM.
Technologies developed by researchers at ORNL have received six 2023 R&D 100 Awards.
Nine student physicists and engineers from the #1-ranked Nuclear Engineering and Radiological Sciences Program at the University of Michigan, or UM, attended a scintillation detector workshop at Oak Ridge National Laboratory Oct. 10-13.
ORNL Corporate Fellow and Center for Nanophase Materials Sciences researcher Bobby Sumpter has been named fellow of two scientific professional societies: the Institute of Physics and the International Association of Advanced Materials.
ORNL's Larry Baylor and Andrew Lupini have been elected fellows of the American Physical Society.
Thirty-two Oak Ridge National Laboratory employees were named among teams recognized by former DOE Secretary Dan Brouillette with Secretary’s Honor Awards as he completed his term. Four teams received new awards that reflect DOE responses to the coronavirus pandemic.
Six scientists at the Department of Energy’s Oak Ridge National Laboratory were named Battelle Distinguished Inventors, in recognition of obtaining 14 or more patents during their careers at the lab.
Geoffrey L. Greene, a professor at the University of Tennessee, Knoxville, who holds a joint appointment with ORNL, will be awarded the 2021 Tom Bonner Prize for Nuclear Physics from the American Physical Society.