1631 - 1640 of 1959 Results
Microbial ethanol tolerance has been thought to be a complex and likely a multigenic trait. To date, little progress has been made in identification of key genetic changes that confer enhanced ethanol tolerance.
Recent advancements in nanostructural engineering offer great potential for the design, fabrication and creation of novel ordered structures with predictable physical and chemical properties for energy related technologies.
The separation of low molecular weight organics using a robust inorganic nanoporous membrane with tailored properties is an innovative approach for the high temperature pretreatment of cellulosic biomass.
Practices are described for preparing fine-grain stress-tolerant, brittle, doped semiconductor thermoelectric elements better suited to withstand thermal and mechanical loads without cracking or fracture.
Helium-3 is now so scarce as to be practically unavailable. Boron-10 is a well-known neutron converter isotope with energetic charged daughter particles. All known boron gaseous boron compounds are highly toxic and thus considered unsuitable for widespread deployment.
Cermet formulations are provided for integrated waste forms that comprise a composite of tailored ceramic phases encapsulated in a special metal matrix. The ceramic phases immobilize certain radioisotopes in a stable, low-leachability chemical form. The metal
This invention provides a concept and route to fabrication of a Fully-Ceramic, silicon carbide (SiC) matrix, Micro-encapsulated nuclear fuel (FCM). The described FCM has moderate thermal conductivity and is repository stable.
This invention disclosure describes the use ORNL’s superhydrophobic powders in the evaporative desalination process.
This invention is directed to a process of manufacturing of complex three dimensional devices. The invention process employs a technology to produce a wide variety of functional nanomaterials (magnetic, optical, electrical...). The nanomaterials are then deposited,
The invention relates to a sputtering target for carrying out a Physical Vapor Deposition (PVD) coating process and more specifically, a PVD coating process where the sputtering target is sputtered by bombardment with gas atoms and/or ions and a layer consisting of a plurality