For his extensive contributions to large-scale and high-speed advanced manufacturing and 3-D printing; for blending additive manufacturing with fluid-powered systems to develop lightweight, high-dexterity, and low-cost prosthetics; and for his tireless mentoring of students at all levels in science, technology, engineering, and mathematics.
David C. Radford
“For pioneering nuclear structure studies with radioactive ion beams, development of innovative software for gamma ray spectroscopy, and significant contributions to gamma ray tracking detectors.”
For internationally recognized contributions in distributed and cluster computing, including the development of the Parallel Virtual Machine and the Message Passing Interface standard now widely used in science to solve computational problems in biology, physics, chemistry, and materials science.
For leadership in the development of high-temperature materials for energy and space applications, based on innovative use of physical metallurgy principles and basic physics knowledge to understand crystal structures and the mechanical properties of structural materials.
For applying molecular beam techniques to study chemically reactive collisions, helping to lay the foundation for the present field of chemical dynamics, and for pioneering studies in accelerator-based atomic physics, ion-solid interactions, and the channeling of ions, electrons and positrons in crystalline solids.
For discoveries of fundamental importance in mammalian genetics, as well as for studies of genetic and developmental effects in mice, which have provided a broad basis for assessment of the genetic risk to humans from radiation and chemicals, including the development of genetic and early developmental tests now used worldwide.
For application of chemical and engineering principles to the development of nuclear fuel processing; separation science and technology; and innovative biomedical and bioprocessing concepts for environmental protection, energy production and conservation, and resource recovery