ORNL scientists develop a sample holder that tumbles powdered photochemical materials within a neutron beamline — exposing more of the material to light for increased photo-activation and better photochemistry data capture.
ORNL researchers used electron-beam additive manufacturing to 3D-print the first complex, defect-free tungsten parts with complex geometries.
Groundwater withdrawals are expected to peak in about one-third of the world’s basins by 2050, potentially triggering significant trade and agriculture shifts, a new analysis finds.
Thomas Proffen, a neutron scattering scientist at ORNL and founder of Oak Ridge Computer Science Girls, was recognized with an award from the National Center for Women & Information Technology, or NCWIT. In addition, one of his students received a national honor from the organization.
An international team using neutrons set the first benchmark (one nanosecond) for a polymer-electrolyte and lithium-salt mixture. Findings could produce safer, more powerful lithium batteries.
The Neutron Scattering Society of America, or NSSA, recognized Oak Ridge National Laboratory’s Ke An and Ken Herwig as fellows for their outstanding contributions to neutron scattering.
Two different teams that included Oak Ridge National Laboratory employees were honored Feb. 20 with Secretary’s Honor Achievement Awards from the Department of Energy. This is DOE's highest form of employee recognition.
To capitalize on AI and researcher strengths, scientists developed a human-AI collaboration recommender system for improved experimentation performance.
Rigoberto “Gobet” Advincula, a scientist at the Department of Energy’s Oak Ridge National Laboratory, has been appointed a Fellow of the Institute of Materials, Minerals and Mining.
Rigoberto “Gobet” Advincula, a scientist at the Department of Energy’s Oak Ridge National Laboratory, has been named a 2023 Fellow of the National Academy of Inventors. Advincula has been recognized for his 14 patents and 21 published filings related to nanomaterials, smart coatings and films, solid-state device fabrication and chemical additives.