Forrest Hoffman, a distinguished scientist at the Department of Energy’s Oak Ridge National Laboratory, has been named a senior member of the Institute of Electrical and Electronics Engineers, the world’s largest organization for technical professionals.
Scientists at ORNL have developed 3D-printed collimator techniques that can be used to custom design collimators that better filter out noise during different types of neutron scattering experiments
ORNL scientists and researchers attended the annual American Geophysical Union meeting and came away inspired for the year ahead in geospatial, earth and climate science.
Rigoberto “Gobet” Advincula, a scientist at the Department of Energy’s Oak Ridge National Laboratory, has been appointed a Fellow of the Institute of Materials, Minerals and Mining.
From July 15 to 26, 2024, the Department of Energy’s Oak Ridge National Laboratory will host the second U.S. Quantum Information Science, or QIS, Summer School.
New computational framework speeds discovery of fungal metabolites, key to plant health and used in drug therapies and for other uses.
ORNL’s successes in QIS and its forward-looking strategy were recently recognized in the form of three funding awards that will help ensure the laboratory remains a leader in advancing quantum computers and networks.
In summer 2023, ORNL's Prasanna Balaprakash was invited to speak at a roundtable discussion focused on the importance of academic artificial intelligence research and development hosted by the White House Office of Science and Technology Policy and the U.S. National Science Foundation.
The 2023 top science achievements from HFIR and SNS feature a broad range of materials research published in high impact journals such as Nature and Advanced Materials.
Rigoberto “Gobet” Advincula, a scientist at the Department of Energy’s Oak Ridge National Laboratory, has been named a 2023 Fellow of the National Academy of Inventors. Advincula has been recognized for his 14 patents and 21 published filings related to nanomaterials, smart coatings and films, solid-state device fabrication and chemical additives.