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Exposing high-energy surfaces by rapid-anneal solid phase epitaxy...

Publication Type
Journal
Journal Name
APL Materials
Publication Date
Page Number
086103
Volume
5
Issue
8

The functional design of nanoscale transition metal oxide heterostructures depends critically on the growth of atomically flat epitaxial thin films. Often, improved functionality is expected for heterostructures and surfaces with orientations that do not have the lowest surface free energy. For example, crystal faces with a high surface free energy, such as rutile (001) planes, frequently exhibit higher catalytic activities but are correspondingly harder to synthesize due to energy-lowering faceting transitions. Here we propose a broadly applicable rapid-anneal solid phase epitaxial synthesis approach for the creation of atomically flat, high surface free energy oxide heterostructures. We demonstrate its efficacy via the synthesis of atomically flat, epitaxial RuO2(001) films with a superior oxygen evolution activity, quantified by their lower onset potential and higher current density, relative to that of more common RuO2(110) films.