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Electron transfer and ionic displacements as the origin of the 2D electron gas at the LAO/STO interface: Direct measurements ...

Publication Type
Journal
Journal Name
Advanced Materials
Publication Date
Page Numbers
3952 to 3957
Volume
24
Issue
29

We present direct, atomic-column-resolved scanning transmission electron microscopy and electron energy loss measurements of atomic displacements and Ti valence in abrupt, conductive LAO/STO interfaces. We find that two distinct but interrelated mechanisms are responsible for screening the diverging electric potential in the LAO film: 1) charge injection in the interfacial Ti planes, and 2) dielectric relaxation in both LAO and STO through ionic displacements. The injected charge density decays over a length of nearly 3 unit cells within the STO substrate. The total injected charge is lower than predicted by pure electronic reconstruction. The origin of this discrepancy is attributed to cation and oxygen displacements, which we observe in both LAO and STO, and generate a polarization opposite to the intrinsic polarization of the LAO film. Our data attribute a minor role to oxygen vacancies and cation intermixing.