Ivan I Kravchenko

R&D staff member

Google Scholar Profile:https://scholar.google.com/citations?hl=en&user=uB1y8L4AAAAJ&view_op=li… ID:0000-0003-4999-5822ResearcherID:K-3022-2015EducationKyiv State University, Ukraine M.S., With distinction, 1982, Materials Sciences Institute of Metal Physics , National Academy of Sciences, Kyiv, Ukraine Ph.D., 1993, Surface Physics, Solid State PhysicsProfessional Experience2008–present R&D Staff Member at the Center for Nanophase Materials Sciences, Oak Ridge National Laboratory2002–2008 Nano-Fabrication Facility Engineer, University of Florida.1997-2002 Electrostatic Particle Accelerator Engineer. Department of Physics, University of Florida.1996 Research Associate, Department of Physics, University of Florida 1994–1995 Research Associate, Department of Materials Science, University of Wisconsin- Madison 1985-1993 Staff Physicist, Institute of metal Physics, National Academy of Sciences, Kyiv, UkraineResearch Interests:1. Design and manufacture of nanometer scale metallic, semiconductor, and dielectric structures. We use electron beam lithography, dielectric and metallic thin film deposition, thin film plasma processing techniques, optical spectroscopies and ellipsometry to create and study sub-wavelength features which enable the resonant excitation of surface waves by incident electromagnetic radiation, leading to remarkable optical properties, such as extraordinarily light transmission and beaming as well as surface enhanced Raman spectroscopy. 2. Development and manufacture of electronic devices. We use electron beam and photo-lithography, dielectric and metallic thin film deposition, thin film plasma processing techniques to create and study high electron mobility transistors as well as light emitting elements. 3. Studies of single magnetic domain properties. We use electron beam lithography and photolithography, dielectric and metallic thin film deposition, thin film plasma processing techniques, magnetic low temperature measuring techniques to create nanometer scale metallic structures that allow an unambiguous determination of the magnetic states and separation of the contributions of the anisotropies, domain wall motion and spin fluctuation to the dynamic properties. 4. Manufacture technology development and optical studies of quazi-1D dielectric and semiconducting structures. We use electron beam lithography, dielectric and metallic thin film deposition, thermal processing techniques, optical spectroscopies to create and study nanowires and nanotubes that might be needed to develop next generation of energy storage and solar energy harvesting devices.