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Nova 600 NanoLab dual beam SEM/FIB

The Thermo Fischer Scientific Nova 600 NanoLab dual beam microscope is used primarily to image and edit materials at the nano/microscale.  Traditionally, the focused electron beam is used for non-destructive imaging but can also be used for 3D nanoprinting.  Subtractive editing, or milling, of surface layers is possible using the focused ion beam.

Science Overview

Third party capabilities available on the Nova 600 expand the range of materials synthesis capabilities, beyond the traditional imaging and characterization applications.  A Waviks Inc. in situ laser irradiation (@ l = 405, 785 and 915 nm ~102kW/cm2) system enables substrate heating during imaging/synthesis with ample power to achieve film/surface melting for insulated samples.  Electron beam lithography is possible using the Raith ELPHY Quantum electron beam lithography add-on, ideal for ‘chip–size’ lithography (centimeter sized substrates) or for sub wafer scale exposure. 


Electron imaging and characterization, ion beam surface milling/editing, in situ laser induced processing (micrometer beam size with both continuous and pulsed lasing), energy dispersive spectroscopy, 3D nanoprinting (nanowire-based geometries spanning microscale dimensions), using available precursor gases (mTorr scale pressure range) and CNMS developed software for CAD and, finally,  electron beam lithography (50nm resolution over micrometer scale write–field sizes).

Beam Specifications

  • Focused electron beam
    • Beam spot size: 2 – 10 nm
    • Beam energy: 500 eV – 30 keV
    • Beam current: pA – nA
    • Precursor gases: W(CO)6, (CH3)3PtCpCH3, O2, H2O, XeF2
  • Focused ion beam
    • Gallium liquid metal ion source (LMIS)
    • Beam spot size: 7 – 15 nm
    • Beam energy: 5 – 30 keV
    • Beam current: pA – nA

Recent Highlights

3D Printing at the nanoscale

Direct-write magic wands