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3D Direct-write ion, electron and optical processing

Raith Velion Multiple Ion Species Ion Beam Lithography System

Velion Ion Beam Lithography System

The Raith Velion system is a combined Focused Ion Beam (FIB) and Scanning Electron Microscope (SEM) that operates a variety of isotopically controlled ion sources for imaging, milling and deposition.

Applications include the development of direct writing of optical metasurfaces and metasurface platforms, photonic crystals, optoelectronic and optical systems, plasmonic systems, nano-imprint lithography masters, and field-effect transistors

Specifications

  • Beam size
    • Si++ at 35 keV: 5.7 nm
    • Au++ at 35 keV: 10.6 nm
    • Au+ at 35 keV: 13.2 nm
    • SEM at 10kV:  3.6 nm
  • Minimum feature size patterned in 30 nm Au film ;
    • with Si++ at 35keV: 16.7 nm
    • with Au++ at 35keV: 18.6 nm
  • Tailored high-resolution FE-SEM inspection 30 kV column
  • Laser interferometer stage, 4” full travel.
  • Multi-species ion beam technology
  • Matured software for nanofabrication and inspection
  • Truly continuous writing strategies
  • Gas injection, nano manipulators, rotation and tilt sample holder for inspection.
Plasmonic structures in a gold film.
Plasmonic devices created by ion milling a gold film.
Micropore in a silicon nitride membrane.
A micropore aligned and milled in a silicon nitride membrane.