Lawrence F Allard Jr

Bio

Dr. Larry Allard obtained all three of his degrees at the University of Michigan in the Materials Science and Engineering Dept. He started his electron microscopy career in 1963 as a sophomore, learning theory and practice under Prof. Wilbur Bigelow. He is currently a Distinguished Research Staff Member in DOE's High Temperature Materials Laboratory, a National User Facility located at Oak Ridge National Laboratory. His research involves ultrahigh-resolution imaging and microanalysis studies of nanophase and nanostructured materials,automotive catalytic materials for exhaust after-treatment, and instrumental developments involving in situ electron microscopy, electron holography, digital imaging and remote instrument operation. He is the chief scientist in charge of the Aberration-Corrected Electron Microscope (ACEM) project at the HTML; his JEOL 2200FS instrument one of the first of the new generation of STEM/TEM instruments with sub-Ångström resolution to be installed in the US (2004). He is also the principal technical designer of ORNL’s new Advanced Microscopy Laboratory, a facility housing the most advanced and sensitive modern electron beam instruments. Dr. Allard is the author or co-author of more than 300 scientific publications, a coorganizer of more than a dozen workshops and symposia on advanced microscopy topics, and has co-edited several conference proceedings and books, including “Introduction to Electron Holography,” the first definitive textbook on electron holography, published by Kluwer/Plenum in 1999. Dr. Allard was elected Fellow of the Microscopy Society of America in 2010, in the second Fellows class of the society. He is still collaborating closely with Prof. Bigelow, who at age 92, continues to contribute to the design and fabrication of a myriad of devices and systems that enable the development of the unique capabilities provided by the microscopy groups at ORNL.