
Bio
Dr. Debangshu Mukherjee is an R&D Associate Scientist in the Computational Sciences and Engineering Division at Oak Ridge National Laboratory (ORNL). He joined ORNL in 2018 as a postdoctoral researcher following his PhD in Materials Science and Engineering at The Pennsylvania State University, where he used aberration-corrected electron microscopy to measure atomic displacements across ferroelectric domain walls. Since then, he has focused on developing advanced computing techniques to tackle critical challenges in electron microscopy. His work includes creating software packages that leverage high-performance computing (HPC) for big-data analysis in 4D-STEM structural quantification, cryo-electron single particle analysis, and electron ptychography, as well as designing networking solutions that connect electron microscopes to HPC systems for automated operations.
Professional Experience
- R&D Associate, CSED, ORNL (06/2021 - present)
- Postdoctoral Research Associate, CNMS, ORNL (06/2018 - 04/2021)
Awards
- M&M Postdoctoral Scholar Award (2020)
- Dean's Fellowship, Boston University (2011)
- Best Bachelor's Thesis, IIT Kharagpur (2010)
Education
- Ph.D, Materials Science & Engineering, The Pennsylvania State University University (05/2018)
- M.S., Materials Science & Engineering, Boston University (05/2013)
- M.Tech., Metallurgical Engineering, Indian Institute of Technology, Kharagpur (07/2011)
- B.Tech. (Hons.), Metallurgical & Materials Engineering, Indian Institute of Technology, Kharagpur (05/2011)
Professional Service
- Chair, Electron Microscopy Data Analysis & Management Focused Interest Group, Microscopy Society of America
- Board of Directors, MicroAnalysis Society
Professional Affiliations
- Microscopy Society of America
- MicroAnalysis Society
- American Physical Society
- Materials Research Society
- IEEE
Publications
Other Publications
Mukherjee D., Prokhorenko S., Miao L., Wang K., Bousquet E., Gopalan V. and Alem N.; Atomic-scale measurement of polar entropy. Physical Review B 100(10):104102
Young J., Moon E.J., Mukherjee D., Stone G., Gopalan V., Alem N., May S.J. and Rondinelli J.M.; Polar oxides without inversion symmetry through vacancy and chemical order. Journal of the American Chemical Society 139(7):2833-2841
Zhang H.T., Zhang L., Mukherjee D., Zheng Y.X., Haislmaier R.C., Alem N. and Engel-Herbert R.; Wafer-scale growth of VO2 thin films using a combinatorial approach. Nature Communications 6:8475
Azizi A., Eichfeld S., Geschwind G., Zhang K., Jiang B., Mukherjee D., Hossain L., Piasecki A.F., Kabius B., Robinson J.A. and Alem N; Freestanding van der Waals heterostructures of graphene and transition metal dichalcogenides. ACS Nano 9(5):4882-489
Sahu R.K., Mukherjee D., Tiwari J.P., Mishra T., Roy S.K. and Pathak L.C.; Influence of foreign Fe ions on wet chemical synthesis of Pt nanoparticle thin films at ambient temperature: in situ versus direct addition. Journal of Materials Chemistry 19(37):6810-6815