November 2023

Journal

Topological materials by molecular beam epitaxy

By:
Brahlek, Matthew J; Lapano, Jason M; Lee, Joon Sue
Journal Name:
Journal of Applied Physics
Page Number:
210902
Volume:
128
Issue Number:
21
Publication Date:
November 2023
View DOI Listing:
https://doi.org/10.1063/5.0022948

Abstract

Topology appears across condensed matter physics to describe a wide array of phenomena which could alter, augment, or fundamentally change the functionality of many technologies. Linking the basic science of topological materials to applications requires producing high-quality thin films. This will enable combining dissimilar materials while utilizing dimensionality, symmetry, and strain to create or control the electronic phase, as well as platforms to fabricate novel devices. Yet, one of the longstanding challenges in the field remains understanding and controlling the basic material properties of epitaxial thin films. The aim of this Perspective article is to discuss how understanding the fundamental properties of topological materials grown by molecular beam epitaxy (MBE) is key to deepening the knowledge of the basic physics, while developing a new generation of topological devices. A focus will be on the MBE growth of intrinsic materials, creation, and control of superconducting and magnetic topological phases. Addressing these questions in the coming decade will undoubtedly uncover many surprises as new materials are discovered and their growth as high-quality thin films is refined.


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