July 2024

Journal

Tailoring Interlayer Coupling in Few-Layer MoS2 with Stacking Configuration

By:
Kim, Jong Hun; Jin, Kyung-Hwan; Jung, Yeonjoon; Lee, Gwan-Hyoung; Jo, Moon-Ho; Baik, Jaeyoon; Kim, Daehyun; Baddorf, Arthur P; Li, An-Ping ; Park, Jewook
Journal Name:
ACS Applied Nano Materials
Page Number:
17214-17220
Volume:
7
Issue Number:
15
Publication Date:
July 2024
View DOI Listing:
https://doi.org/10.1021/acsanm.4c02834

Abstract

We manipulated the stacking configuration of a few-layer MoS2 to investigate the impact of interlayer coupling on electrical band engineering. By simultaneously synthesizing two distinct stacking types of MoS2 islands, wedding cake (W) and spiral (S), on the same substrate, we explored layer-dependent electrical properties under identical experimental conditions. We used multiple scanning probe microscopy techniques to map local electronic properties with respect to the number of layers, stacking configurations, and local heterogeneities. First-principles calculations verified the role of distinct interlayer coupling in terms of the interlayer distance. Our findings highlight the critical role of interlayer coupling in applications of transition metal dichalcogenides.


Related Researchers