August 2012

Journal

Electron transfer and ionic displacements as the origin of the 2D electron gas at the LAO/STO interface: Direct measurements with atomic-column spatial resolution.

By:
Cantoni, Claudia ; Gazquez Alabart, Jaume ; Miletto Granozio, Fabio; Oxley, Mark P; Varela Del Arco, Maria ; Lupini, Andrew R; Pennycook, Stephen J; Aruta, Carmela; Scotti di Uccio, Umberto; Perna, Paolo; Maccariello, Davide
Journal Name:
Advanced Materials
Page Number:
3952-3957
Volume:
24
Issue Number:
29
Publication Date:
August 2012
View DOI Listing:
https://doi.org/10.1002/adma.201200667

Abstract

We present direct, atomic-column-resolved scanning transmission electron microscopy and electron energy loss measurements of atomic displacements and Ti valence in abrupt, conductive LAO/STO interfaces. We find that two distinct but interrelated mechanisms are responsible for screening the diverging electric potential in the LAO film: 1) charge injection in the interfacial Ti planes, and 2) dielectric relaxation in both LAO and STO through ionic displacements. The injected charge density decays over a length of nearly 3 unit cells within the STO substrate. The total injected charge is lower than predicted by pure electronic reconstruction. The origin of this discrepancy is attributed to cation and oxygen displacements, which we observe in both LAO and STO, and generate a polarization opposite to the intrinsic polarization of the LAO film. Our data attribute a minor role to oxygen vacancies and cation intermixing.


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