The table-top Raith Picomaster 100 maskless laser writer is UV-based and supports wafers up to 100 mm x 100 mm within a glovebox environment. It is turn-key, user-friendly, and provides a high degree of freedom to create microstructures as small as 300 nm in photosensitive layers.
Specifications/Capabilities/Extras
- Single focused beam (405 nm GaN laser diode) writing strategy – raster and vector mode
- Resolution down to 0.3 um
- 0.3 um to 5 um spot size
- 4096-level grayscale lithography
- 600 um autofocus range
- Up to 100 mm x 100 mm exposable area
- Stitch-free exposure
- 2 nm encoder resolution with 20 nm RMS repeatability
- GDSII, BMP, TIFF, STL, DXF, CIF, and GBR supported file types