Bio
Dr. Asraful Haque is a postdoctoral researcher in the Data NanoAnalytics Group at the Center for Nanophase Materials Sciences, Oak Ridge National Laboratory. He earned his Ph.D. in 2024 from the Center for Nano Science and Engineering (CeNSE), Indian Institute of Science (IISc), Bengaluru, where he investigated ferroelectric thin-film membranes and remote epitaxy of functional oxides using pulsed-laser deposition (PLD). He also holds a master’s degree from the Indian Institute of Technology Kanpur. His current work focuses on AI/ML-driven autonomous thin-film synthesis, functional oxide membranes, and automated workflows for piezoresponse force microscopy (PFM). Email: haquea@ornl.gov
Awards
Best PhD Thesis award from the Center for Nanoscience Engineering at IISC, Bengaluru, 2025.
Best Presentation Award at 29th International Workshop on Oxide Electronics (iWOE), 2023, Busan, Korea
Academic Excellence in Master of Technology at IIT Kanpur
Education
Ph.D, Center for Nanoscience and Engineering (CeNSE), Indian Institute of Science (IISc), Bengaluru, India, 2024
M.Tech, Department of Materials Science and Engineering, Indian Institute of Technology (IIT), Kanpur, UP, India, 2018
B.Tech, Metallurgy and Materials Science and Engineering, National Institute of Technology (NIT), Srinagar, India, 2016