January 2009

Journal

A New MEMS-Based System for Ultra-High-Resolution Imaging at Elevated Temperatures

By:
Allard Jr, Lawrence F; Bigelow, Wilbur C; Jose-Yacaman, Miguel; Nackashi, David P; Damiano Jr, John ; Mick, stephen
Journal Name:
Microscopy Research and Technique
Page Number:
208-215
Volume:
72
Issue Number:
3
Publication Date:
January 2009
View DOI Listing:
https://doi.org/10.1002/jemt.20673

Abstract

In recent years, an increasing number of laboratories have been applying in situ heating (and ultimately, gas reaction) techniques in electron microscopy studies of catalysts and other nanophase materials. With the advent of aberration-corrected electron microscopes that provide sub-A˚ ngstro¨m image resolution, it is of great interest to study the behavior of materials at elevated temperatures while maintaining the resolution capabilities of the microscope. In collaboration with Protochips Inc., our laboratory is developing an advanced capability for in situ heating experiments that overcomes a number of performance problems with standard heating stage technologies. The new heater device allows, for example, temperature cycling from room temperature to greater than 10008C in 1 ms (a heating rate of 1 million Centigrade degrees per second) and cooling at nearly the same rate. It also exhibits a return to stable operation (drift controlled by the microscope stage, not the heater) in a few seconds after large temperature excursions. With Protochips technology, we were able to demonstrate single atom imaging and the behavior of nanocrystals at high temperatures, using high-angle annular dark-field imaging in an aberration-corrected (S)TEM. The new capability has direct applicability for remote operation and (ultimately) for gas reaction experiments using a specially designed environmental cell


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