Multipurpose Argon Ion Beam for Processing Graphene
Progression of the damage to suspended graphene as observed first-principles molecular dynamics simulations. (a) Graphene interacting with the 100 atom Argon ion cluster. (b) Argon ion cluster damaging the graphene surface. (hi-res image)
New experimental and theoretical insights reveal how Argon ion clusters clean, modify, and mill supported and suspended graphene in a single tool.
Significance and Impact
Graphene applications necessitate material transfer, but the resulting contamination reduces performance. The ability to remove contamination, cut and modify the surface, and process large graphene sheet areas in a single tool will accelerate graphene research.
–Previous cleaning approaches relied largely on annealing.
–All processing modalities (cleaning, modifying/functionalizing, milling) can now be consolidated in a single piece of equipment.
–Molecular dynamics simulations reveal the mechanisms behind the Argon ion cluster interaction with graphene, complementing the data obtained with in-situ measurements and electron microscopy.
S. Kim, A. V. Ievlev, J. Jakowski, I. V. Vlassiouk, X. Sang, C. Brown, O. Dyck, R. R. Unocic, S. V. Kalinin, A. Belianinov, B. G. Sumpter, S. Jesse, O. S. Ovchinnikova, "Multi-purposed Ar gas cluster ion beam processing for graphene engineering," Carbon131, 142 (2018). DOI: 10.1016/j.carbon.2018.01.098