Oak Ridge National Laboratory's Nanoscale Science and Technology Laboratory Clean Room Facility offers users superior expertise in compound semiconductor-based device fabrication providing a full range of processes to the scientific and research communities. This premier research facility, which opened in June 2003, is located in Building 3500 at the Oak Ridge National Laboratory, a world leader in materials science, electronic device research and nanofabrication.

The ORNL NSTL facility was constructed to support a wide variety of thin-film and solid state electronic research projects and provides expertise in compound semiconductor-based device fabrication. A full range of processes are available including: lithography, thin-film deposition and etching. The NSTL facility offers users state-of-the-art processes and fabrication techniques including genome research, SEM, AFM and other microscopic evaluation techniques.