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A number of
plasma sources support R&D work in the
semiconductor industry, in space propulsion and in
the plasma processing of materials. We have one
helicon source and three inducively coupled
sources.
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The Mini-Radio Frequency Test
Facility couples a helicon plasma source with a
magnetic mirror plasma confinement device.
Originally built to support plasma-materials
interaction research, the device is currently being
used for light ion plasma heating studies (DOE),
helicon plasma source development (NASA) and arc
formation studies (DOE).
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The large
area plasma source (300mm) is being used to
investigate ion flux uniformity (link to JBOC's GEC
presentation) and the stability of electronegative
process
plasmas.
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A pair of inductively coupled
plasma source chambers used for thin film etch and
deposition. Features include RF voltage and current
probes and various plasma diagnostics, temperature
controlled chucks and plumbed with various process
gases (silane, hydrogen, argon, nitrogen, oxygen
and acetylene
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